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High precision within ±25nm3σ. No focus matrix is required.
The exposure analysis tool, phase shift focus monitor, has high precision within ±25nm 3σ. No focus matrix is required. Focus measurements can be made with existing overlay measurement devices. For more details, please contact us or refer to the catalog.
Measurement of the beam profile of the high-power laser focusing process without attenuation.
The focus monitor measures the beam intensity distribution during the process of focusing and defocusing high-power lasers. It uses a high-speed moving pinhole for measurement, allowing for the measurement of high-power lasers without attenuation. It is possible to replace the measurement chip and detector, and it is compatible with CO2 lasers as well as near-infrared.
